Products > MG Chemicals > Silver Conductive Pen > Presensitized Copper Clad Boards > Instructions for complete Prototyping Process > Developer
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Developer |
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For removing exposed resist during the positive photofabrication process.
- Disolves exposed photoresist
- Concentrated formulation - dilute one part developer to ten parts water
- For best results, use in conjunction with cat# 416-S
foam brush.
- Also available in the 416-K Photofabrication Kit.
Part Number |
Mfr. Part # |
Sizes Available |
Description |
MG-418-500ML |
418-500ML |
500ml (16 oz) |
Liquid |
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